Karyaku

Posted by yasri

• SPIE 2007 : Automatic setup of in-line critical dimension (CD) recipes during OPC qualification in a foundry environment (Proceedings Paper).

• SPIE 2007 : Silicon verification of flare model & application to real chip for long range proximity correction (Proceedings Paper)

• US Patent Application : Lithography process optimization and system

Tentang metode optimisasi sistem litografi menggunakan dua atau lebih iluminator. Tujuannya meningkatkan kejelasan gambar (image fidelity), kedalaman fokus (depth of focus) yang tinggi sehingga suatu desain chip lebih mudah dibuat (manufacturable). Sisanya bisa dibaca di sini.

• SPIE 2006 : Lithography process optimization using linear superposition of commonly available illumination modes (Proceedings Paper)